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On the other hand, at infra-red and optical frequencies, relaxing the working distance between the sample to be imaged and the imaging apparatus can have multiple benefits including (a) imaging of buried objects (b) imaging of sensitive biological specimens (due to the non-invasive nature offered by a longer working distance) and (c) simplification of apparatus such as near-field optical microscopes.
Another very important application of a viable sub-wavelength optical focusing technology is the extension of photolithography to the deep nanoscale regime. Currently the electronics industry is facing a great challenge in keeping up with Moore's law and this is to a large extent due to the limits of photolithography. Proposals to utilize UV light or electron-beam lithography are facing great technological and cost challenges. To this end, a viable nanoscale photolithography technology could provide a revolutionary solution to this very challenging problem.
[1] J. Zhu and G.V. Eleftheriades, "Experimental verification of overcoming the diffraction limit with a volumetric Veselago-Pendry transmission-line lens", Physical Review Letters, 101, 013902, July 04, 2008.
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Metascreen
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Sub-wavelength resolution in the
near-field with a Metascreen
Super-oscillation imaging and sensing with ![]()
Sub-wavelength resolution of objects with a metascreen probe (left). This is not possible with a convetional probe (right)
SUPER-RESOLUTION IMAGING |